Volume 3, Issue 6, November 2015, Page: 99-104
Morphological and Structural Properties of Silver Nanofilms Annealed by RTP in Different Atmospheres
P. D. Nsimama, Dar Es Salaam Institute of Technology, Department of Science and Laboratory Technology, Dar Es Salaam, Tanzania
Received: Nov. 4, 2015;       Accepted: Nov. 13, 2015;       Published: Nov. 26, 2015
DOI: 10.11648/j.nano.20150306.12      View  4072      Downloads  159
Abstract
This study aims at investigating the influence of gas atmospheres on the dewetting properties of DC sputtered and rapid thermally annealed silver (Ag) nanofilms. The annealing temperature ranged from 400℃ to 600℃ and the gases studied were argon (Ar) and nitrogen (N2). Scanning electron microscope (SEM) and focused ion beam (FIB) were employed for morphological studies, while the X-ray diffraction (XRD) technique was applied in the structural analysis of the films. The SEM and top-view FIB-SEM images of Ag films annealed in both atmospheres were characterized by irregular shaped holes. At fixed temperature, the films annealed in the N2 atmospheres gave higher hole density and larger hole sizes than the film annealed in the Ar atmosphere. Additionally, the hole density decreased with the annealing time. For films annealed in the N2 atmosphere, isolated dewetted particles were only obtained at 600℃ substrate temperature. The XRD patterns of all the films were characterized by Ag metallic peaks. No significant difference was observed among the films’ crystal structures. The annealing atmospheres mainly influences the morphologies of Ag nanofilms.
Keywords
Ag, Dewetting, Annealing Atmosphere, FIB
To cite this article
P. D. Nsimama, Morphological and Structural Properties of Silver Nanofilms Annealed by RTP in Different Atmospheres, American Journal of Nano Research and Applications. Vol. 3, No. 6, 2015, pp. 99-104. doi: 10.11648/j.nano.20150306.12
Copyright
Copyright © 2015 Authors retain the copyright of this article.
This article is an open access article distributed under the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0/) which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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